| 1 |
Characterization of residual implant damage by generation time technique
Jee YJ, Kim CY, Jun CS, Kim TS, Belyaev A, Marinskiy D
Solid-State Electronics, 82, 16, 2013 |
| 2 |
반도체 생산공정의 대기질 개선을 위한 복합 대기오염물의 습식화학 제거공정
전창성, 김학주, 박영무, 이대원, 함동석, 전상문, 이관영
Clean Technology, 13(2), 109, 2007 |
| 3 |
Dopant loss of ultrashallow junction by wet chemical cleaning
Buh GH, Park T, Yon GH, Kim SB, Jee YJ, Hong SJ, Ryoo C, Yoo JR, Lee JW, Jun CS, Shin YG, Chung UI, Moon JT
Journal of Vacuum Science & Technology B, 24(1), 499, 2006 |
| 4 |
Quantitative analysis of ultrashallow junction of sub-50 nm gate-length transistors: Junction depth, sheet resistance, short channel effects, and transistor performance
Buh GH, Park T, Yon GH, Hong SJ, Ryoo CW, Yoo JR, Lee JW, Jee YJ, Lee JS, Jun CS, Shin YG, Chung UI, Moon JT
Journal of Vacuum Science & Technology B, 24(1), 503, 2006 |
| 5 |
Palladium and palladium alloy composite membranes prepared by metal-organic chemical vapor deposition method (cold-wall)
Jun CS, Lee KH
Journal of Membrane Science, 176(1), 121, 2000 |
| 6 |
Preparation of palladium membranes from the reaction of Pd(C3H3)(C5H5) with H-2: wet-impregnated deposition
Jun CS, Lee KH
Journal of Membrane Science, 157(1), 107, 1999 |
| 7 |
Synthesis of B2H5Feco(Co)(6), Fe2Co(Co)(9)(Mu-Co)Bh2, Feco2(Co)(9)(Mu-Co)BH, Feco2(Co)(9)(BH)(2), and Hfe3Co(Co)(12)BH - Co(Co)(3) Fragment Addition and Fragment Exchange in Ferraborane Clusters
Jun CS, Bandyopadhyay AK, Fehlner TP
Inorganic Chemistry, 35(8), 2189, 1996 |
| 8 |
Preparation and Characterization of Cobaltaboranes Containing Cobalt Carbonyl Fragments
Jun CS, Halet JF, Rheingold AL, Fehlner TP
Inorganic Chemistry, 34(8), 2101, 1995 |
| 9 |
Preparation and Structure of (Asph4)2(Hfe7(Co)20B) - Evidence for the Sequential Encapsulation of a Boron Atom into an Iron Cage by a Radical-Driven Cluster-Building Process
Bandyopadhyay A, Shang MY, Jun CS, Fehlner TP
Inorganic Chemistry, 33(17), 3677, 1994 |
