화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Substrate effects on hardness and polishing of SiO2 thin films
Kallingal CG, Tomozawa M, Murarka SP
Journal of the Electrochemical Society, 145(5), 1790, 1998
2 An investigation of slurry chemistry used in chemical mechanical planarization of aluminum
Kallingal CG, Duquette DJ, Murarka SP
Journal of the Electrochemical Society, 145(6), 2074, 1998
3 Effect of plasma processing on the morphological evolution of thin films
Rajan K, Naeem M, Kallingal CG
Chemical Engineering Communications, 153, 221, 1996