화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Nanocluster dynamics in fast rate epitaxy under mesoplasma condition
Chen LW, Shibuta Y, Kambara M, Yoshida T
Chemical Physics Letters, 564, 47, 2013
2 Superhigh-Rate Epitaxial Silicon Thick Film Deposition from Trichlorosilane by Mesoplasma Chemical Vapor Deposition
Wu SD, Kambara M, Yoshida T
Plasma Chemistry and Plasma Processing, 33(2), 433, 2013
3 Low temperature silicon epitaxy from trichlorosilane via mesoplasma chemical vapor deposition
Fukuda J, Kambara M, Yoshida T
Thin Solid Films, 519(20), 6759, 2011
4 Instantaneous cleaning of silicon substrates by mesoplasma for high-rate and low-temperature epitaxy
Diaz JMA, Harima K, Kambara M, Yoshida T
Thin Solid Films, 518(3), 976, 2009
5 Inhibition of PrPSc formation by synthetic O-sulfated glycopyranosides and their polymers
Yamaguchi S, Nishida Y, Sasaki K, Kambara M, Kim CL, Ishiguro N, Nagatsuka T, Uzawa H, Horiuchi M
Biochemical and Biophysical Research Communications, 349(2), 485, 2006
6 Novel zirconia composite coatings fabricated by twin hybrid plasma spraying
Huang HJ, Eguchi K, Kambara M, Yoshida T
Materials Science Forum, 475-479, 2883, 2005
7 Improved-trapped magnetic fields in top seeded melt grown YBCO superconductor doped with depleted and enriched uranium oxide
Cardwell DA, Babu NH, Kambara M, Shi YH, Tarrant CD, Schneider KR
Materials Science Forum, 426-4, 3499, 2003
8 Effects of dissipation on contact angle measurements using a dynamic method
Tsekov R, Matsumura H, Kawasaki K, Kambara M
Journal of Colloid and Interface Science, 233(1), 136, 2001
9 Nano-structured intermetallic compound TiAl obtained by crystallization of mechanically alloyed amorphous TiAl, and its subsequent grain growth
Kambara M, Uenishi K, Kobayashi KF
Journal of Materials Science, 35(11), 2897, 2000