검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Mask bias requirement for 0.13 mu m e-beam block exposure lithography Takahashi K, Kanata H, Nara Y Journal of Vacuum Science & Technology B, 16(6), 3279, 1998 |
| 2 |
Analytical Study on the Interface of Polymer Blends from Advanced Copna-Resin and Nylon-6 Nawa K, Kanata H Journal of Applied Polymer Science, 63(5), 549, 1997 |