검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Surface loss rates of H and Cl radicals in an inductively coupled plasma etcher derived from time-resolved electron density and optical emission measurements Curley GA, Gatilova L, Guilet S, Bouchoule S, Gogna GS, Sirse N, Karkari S, Booth JP Journal of Vacuum Science & Technology A, 28(2), 360, 2010 |