검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Environmental stability of 193 nm single layer chemically amplified resists Timko AG, Houlihan FM, Cirelli RA, Nalamasu O, Yoshino H, Itani T, Tanabe H, Kasama K Journal of Vacuum Science & Technology B, 17(1), 101, 1999 |
| 2 |
Polymer structure effect on dissolution characteristics and acid diffusion in chemically amplified deep ultraviolet resists Itani T, Yoshino H, Hashimoto S, Yamana M, Samoto N, Kasama K Journal of Vacuum Science & Technology B, 15(6), 2541, 1997 |
| 3 |
Investigation of the notching effect for single layer deep ultraviolet resist processing Yoshino H, Itani T, Hashimoto S, Yamana M, Yoshii T, Samoto N, Kasama K Journal of Vacuum Science & Technology B, 15(6), 2601, 1997 |
| 4 |
A Study of Acid Diffusion in Chemically Amplified Deep-Ultraviolet Resist Itani T, Yoshino H, Hashimoto S, Yamana M, Samoto N, Kasama K Journal of Vacuum Science & Technology B, 14(6), 4226, 1996 |
| 5 |
Photoacid Bulkiness on Dissolution Kinetics in Chemically Amplified Deep-Ultraviolet Resists Itani T, Yoshino H, Fujimoto M, Kasama K Journal of Vacuum Science & Technology B, 13(6), 3026, 1995 |