화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Computer simulation for morphology, size, and density of oxide precipitates in CZ silicon
Sueoka K, Akatsuka M, Okui M, Katahama H
Journal of the Electrochemical Society, 150(8), G469, 2003
2 Nitrogen effect on grown-in defects in Czochralski silicon crystals
Umeno S, Ono T, Tanaka T, Asayama E, Nishikawa H, Hourai M, Katahama H, Sano M
Journal of Crystal Growth, 236(1-3), 46, 2002
3 Hydrogen plasma irradiation and postannealing effects on crystalline quality at vicinal Si (100) surface
Asai K, Komachi K, Kamei K, Katahama H
Applied Surface Science, 153(2-3), 134, 2000
4 Effect of heavy boron doping on oxygen precipitation in Czochralski silicon substrates of epitaxial wafers
Sueoka K, Akatsuka M, Yonemura M, Ono T, Asayama E, Katahama H
Journal of the Electrochemical Society, 147(2), 756, 2000
5 Internal gettering for Ni contamination in Czochralski silicon wafers
Sueoka K, Sadamitsu S, Koike Y, Kihara T, Katahama H
Journal of the Electrochemical Society, 147(8), 3074, 2000
6 Investigation of the mechanical strength of hydrogen-annealed Czochralski silicon wafers
Sueoka K, Akatsuka M, Katahama H, Adachi N
Journal of the Electrochemical Society, 146(1), 364, 1999
7 Calculation of slip length in 300 mm silicon wafers during thermal processes
Akatsuka M, Sueoka K, Katahama H, Adachi N
Journal of the Electrochemical Society, 146(7), 2683, 1999
8 Dependence of Mechanical Strength of Czochralski Silicon-Wafers on the Temperature of Oxygen Precipitation Annealing
Sueoka K, Akatsuka M, Katahama H, Adachi N
Journal of the Electrochemical Society, 144(3), 1111, 1997