화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Experimentally unraveling the energy flux originating from a DC magnetron sputtering source
Gauter S, Haase F, Kersten H
Thin Solid Films, 669, 8, 2019
2 Influence of humidity on atmospheric pressure air plasma treatment of aluminium surfaces
Prysiazhnyi V, Zaporojchenko V, Kersten H, Cernak M
Applied Surface Science, 258(14), 5467, 2012
3 Electrocatalysts for oxygen reduction prepared by plasma treatment of carbon-supported cobalt tetramethoxyphenylporphyrin
Herrmann I, Bruser V, Fiechter S, Kersten H, Bogdanoff P
Journal of the Electrochemical Society, 152(11), A2179, 2005
4 Micro-disperse particles as probes for plasma surface interaction
Kersten H, Deutsch H, Otte M, Swinkels GHPM, Kroesen GMW
Thin Solid Films, 377-378, 530, 2000
5 Investigations on the energy influx at plasma processes by means of a simple thermal probe
Kersten H, Rohde D, Berndt J, Deutsch H, Hippler R
Thin Solid Films, 377-378, 585, 2000
6 On the energy influx to the substrate during sputter deposition of thin aluminium films
Kersten H, Kroesen GMW, Hippler R
Thin Solid Films, 332(1-2), 282, 1998
7 Thin-Film Deposition by Reactive Magnetron Sputtering - On the Influence of Target Oxidation and Its Effect on Surface-Properties
Rohde D, Kersten H, Eggs C, Hippler R
Thin Solid Films, 305(1-2), 164, 1997
8 Process-Control of RF Plasma-Assisted Surface Cleaning
Steffen H, Schwarz J, Kersten H, Behnke JF, Eggs C
Thin Solid Films, 283(1-2), 158, 1996
9 Plasma Wall Interaction for TiNx Film Deposition in a Hollow-Cathode Arc-Discharge
Eggs C, Kersten H, Wagner HE, Wulff H
Thin Solid Films, 290-291, 381, 1996
10 Deposition of Titanium in a Hollow-Cathode Arc-Discharge - Correlation Between Deposition Conditions and Film Properties
Steffen H, Eggs C, Kersten H
Thin Solid Films, 290-291, 386, 1996