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| No. | Article |
|---|---|
| 1 |
Ion-Implantation and Annealing Conditions for Delamination of Silicon Layers by Hydrogen-Ion Implantation Hara T, Kakizaki Y, Kihana T, Oshima S, Kitamura T, Kajiyama K, Yoneda T, Sekine K, Inoue M Journal of the Electrochemical Society, 144(4), L78, 1997 |