검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
SiO2 to Si Selectivity Mechanisms in High-Density Fluorocarbon Plasma-Etching Kirmse KH, Wendt AE, Disch SB, Wu JZ, Abraham IC, Meyer JA, Breun RA, Woods RC Journal of Vacuum Science & Technology B, 14(2), 710, 1996 |
| 2 |
Fluorocarbon High-Density Plasmas .8. Study of the Ion Flux Composition at the Substrate in Electron-Cyclotron-Resonance Etching Processes Using Fluorocarbon Gases Kirmse KH, Wendt AE, Oehrlein GS, Zhang Y Journal of Vacuum Science & Technology A, 12(4), 1287, 1994 |