화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Synthesis of poly[N-(1-adamantyl)vinylsulfonamide-co-2-(2-methyl)adamantyl methacrylatel for 193 nm lithography
Fukuhara T, Shibasaki Y, Ando S, Kishimura S, Endo M, Sasago M, Ueda M
Macromolecules, 38(8), 3041, 2005
2 Effect of Gaseous Permeability of Overcoat Layer on KrF Chemically Amplified Positive Resists
Kishimura S, Sakai J, Tsujita K, Matsui Y
Journal of Vacuum Science & Technology B, 14(6), 4234, 1996
3 Insolubilization Mechanism of Chemically Amplified Negative Photoresists
Yamaguchi A, Kishimura S, Tsujita K, Morimoto H, Tsukamoto K, Nagata H
Journal of Vacuum Science & Technology B, 11(6), 2867, 1993