검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
A comparative electrchemical study of copper deposition onto silicon from dilute and buffered hydrofluoric acids Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS Journal of the Electrochemical Society, 145(1), 241, 1998 |
| 2 |
Electrochemical impedance spectroscopy of copper deposition on silicon from dilute hydrofluoric acid solutions Cheng X, Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS Journal of the Electrochemical Society, 145(1), 352, 1998 |
| 3 |
Electrochemical Measurements During the Chemical-Mechanical Polishing of Tungsten Thin-Films Kneer EA, Raghunath C, Mathew V, Raghavan S, Jeon JS Journal of the Electrochemical Society, 144(9), 3041, 1997 |
| 4 |
Electrochemistry of Chemical-Vapor-Deposited Tungsten Films with Relevance to Chemical-Mechanical Polishing Kneer EA, Raghunath C, Raghavan S, Jeon JS Journal of the Electrochemical Society, 143(12), 4095, 1996 |