검색결과 : 13건
No. | Article |
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1 |
Mechanical and ellipsometry measurements of thin TiN layer prepared by PIII Abd El-Rahman AM, Raaif M, Mohamed SH, Kolitsch A Materials Chemistry and Physics, 132(1), 91, 2012 |
2 |
The correlation between mechanical stress, thermal shift and refractive index in HfO(2), Nb(2)O(5), Ta(2)O(5) and SiO(2) layers and its relation to the layer porosity Stenzel O, Wilbrandt S, Kaiser N, Vinnichenko M, Munnik F, Kolitsch A, Chuvilin A, Kaiser U, Ebert J, Jakobs S, Kaless A, Wuthrich S, Treichel O, Wunderlich B, Bitzer M, Grossl M Thin Solid Films, 517(21), 6058, 2009 |
3 |
Structural and mechanical characterization of BCxNy thin films deposited by pulsed reactive magnetron sputtering Krause M, Bedel L, Taupeau A, Kreissig U, Munnik F, Abrasonis G, Kolitsch A, Radnoczi G, Czigany Z, Vanhulsel A Thin Solid Films, 518(1), 77, 2009 |
4 |
Plasma influence on the properties and structure of indium tin oxide films produced by reactive middle frequency pulsed magnetron sputtering Rogozin A, Vinnichenko M, Shevchenko N, Kolitsch A, Moller W Thin Solid Films, 496(2), 197, 2006 |
5 |
Synthesis of carbon nitride thin films by low-energy ion beam assisted evaporation: on the mechanisms for fullerene-like microstructure formation Gago R, Neidhardt J, Vinnichenko M, Kreissig U, Czigany Z, Kolitsch A, Hultman L, Moller W Thin Solid Films, 483(1-2), 89, 2005 |
6 |
Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering Rogozin AI, Vinnichenko MV, Kolitsch A, Moller W Journal of Vacuum Science & Technology A, 22(2), 349, 2004 |
7 |
Stress measurement and stress relaxation during magnetron sputter deposition of cubic boron nitride thin films Abendroth B, Gago R, Kolitsch A, Moller W Thin Solid Films, 447, 131, 2004 |
8 |
Damage effects from medium-energy ion bombardment during the growth of cubic-boron nitride films Gago R, Vinnichenko M, Abendroth B, Kolitsch A, Moller W Journal of Vacuum Science & Technology A, 21(5), 1739, 2003 |
9 |
Stress relaxation during annealing of boron nitride films Fitz C, Kolitsch A, Fukarek W Thin Solid Films, 389(1-2), 173, 2001 |
10 |
On the role of laminate architecture in thin films synthesized by ion beam assisted deposition Wang X, Kolitsch A, Mueklich A, Prokert F, Moeller W Journal of Materials Science Letters, 19(6), 485, 2000 |