검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Smooth and vertical-sidewall InP etching using Cl-2/N-2 inductively coupled plasma Lin J, Leven A, Weimann NG, Yang Y, Kopf RF, Reyes R, Chen YK, Chao FS Journal of Vacuum Science & Technology B, 22(2), 510, 2004 |
| 2 |
Thin-film resistor fabrication for InP technology applications Kopf RF, Melendes R, Jacobson DC, Tate A, Melendes MA, Reyes RR, Hamm RA, Yang Y, Frackoviak J, Weimann NG, Maynard HL, Liu CT Journal of Vacuum Science & Technology B, 20(3), 871, 2002 |
| 3 |
Comparison of the effects of H-2 and D-2 plasma exposure on AlGaAs/GaAs high electron mobility transistors Luo B, Ren F, Lee KP, Pearton SJ, Wu CS, Kopf RF, Johnson D, Sasserah JN Solid-State Electronics, 45(9), 1613, 2001 |
| 4 |
GaN/AlGaN HBT fabrication Ren F, Han J, Hickman R, Van Hove JM, Chow PP, Klaassen JJ, LaRoche JR, Jung KB, Cho H, Cao XA, Donovan SM, Kopf RF, Wilson RG, Baca AG, Shul RJ, Zhang L, Willison CG, Abernathy CR, Pearton SJ Solid-State Electronics, 44(2), 239, 2000 |
| 5 |
Alignment with exposed resist in photolithography Burm J, Tate A, Kopf RF, Ryan RW, Hamm RA, Chirovsky LM Journal of Vacuum Science & Technology B, 17(3), 905, 1999 |
| 6 |
High density plasma damage in InGaP/GaAs and AlGaAs/GaAs high electron mobility transistors Lee JW, Pearton SJ, Ren F, Kopf RF, Kuo JM, Shul RJ, Constantine C, Johnson D Journal of the Electrochemical Society, 145(11), 4036, 1998 |
| 7 |
Side-by-side wafer bonding of InP for use with stepper-based lithography Ryan RW, Kopf RF, Tate A, Burm J, Hamm RA Journal of Vacuum Science & Technology B, 16(4), 2110, 1998 |
| 8 |
Dielectric-assisted trilayer lift-off process for improved metal definition Ryan RW, Kopf RF, Hamm RA, Malik RJ, Masaitis R, Opila R Journal of Vacuum Science & Technology B, 16(5), 2759, 1998 |
| 9 |
Low-Temperature Chlorine-Based Dry-Etching of III-V Semiconductors Pearton SJ, Abernathy CR, Kopf RF, Ren F Journal of the Electrochemical Society, 141(8), 2250, 1994 |
| 10 |
Comparison of Multipolar and Magnetic-Mirror Electron-Cyclotron-Resonance Sources for CH4 H-2 Dry-Etching of III-V Semiconductors Pearton SJ, Abernathy CR, Kopf RF, Ren F, Hubson WS Journal of Vacuum Science & Technology B, 12(3), 1333, 1994 |