검색결과 : 16건
| No. | Article |
|---|---|
| 1 |
3 omega thermal conductivity measurements of thin film dielectrics on silicon for use in cantilever-based IR imaging Jones CDW, Pardo F, Pai CS, Bower JE, Miner JF, Klemens FP, Cirelli RA, Ferry EJ, Taylor JA, Baker MR, Dennis BS, Mansfield WM, Kornblit A, Keller RC, Gates JV, Ramirez AP Journal of Vacuum Science & Technology B, 27(3), 1207, 2009 |
| 2 |
Small-signal performance and modeling of sub-50 nm nMOSFETs with f(T) above 460-GHz Dimitrov V, Heng JB, Timp K, Dimauro O, Chan R, Hafez M, Feng J, Sorsch T, Mansfield W, Miner J, Kornblit A, Klemens F, Bower J, Cirelli R, Ferry EJ, Taylor A, Feng M, Timp G Solid-State Electronics, 52(6), 899, 2008 |
| 3 |
Synthesis of carbon nanotubes: Controlled fabrication of intraconnects Katz D, Lee SW, Lopez D, Kornblit A, Grebel H Journal of Vacuum Science & Technology B, 25(4), 1191, 2007 |
| 4 |
Spatial light modulator for maskless optical projection lithography Watson GP, Aksyuk V, Simon ME, Tennant DM, Cirelli RA, Mansfield WM, Pardo F, Lopez DO, Bolle CA, Papazian AR, Basavanhally N, Lee J, Fullowan R, Klemens F, Miner J, Kornblit A, Sorsch T, Fetter L, Peabody M, Bower JE, Weiner JS, Low YL Journal of Vacuum Science & Technology B, 24(6), 2852, 2006 |
| 5 |
Plasma deposition of fluorocarbon thin films from c-C4F8 using pulsed and continuous rf excitation Labelle CB, Opila R, Kornblit A Journal of Vacuum Science & Technology A, 23(1), 190, 2005 |
| 6 |
Investigation of fluorocarbon plasma deposition from c-C4F8 for use as passivation during deep silicon etching Labelle CB, Donnelly VM, Bogart GR, Opila RL, Kornblit A Journal of Vacuum Science & Technology A, 22(6), 2500, 2004 |
| 7 |
Determination of electron temperature, atomic fluorine concentration, and gas temperature in inductively coupled fluorocarbon/rare gas plasmas using optical emission spectroscopy Schabel MJ, Donnelly VM, Kornblit A, Tai WW Journal of Vacuum Science & Technology A, 20(2), 555, 2002 |
| 8 |
The vertical replacement-gate (VRG) MOSFET Hergenrother JM, Oh SH, Nigam T, Monroe D, Klemens FP, Kornblit A Solid-State Electronics, 46(7), 939, 2002 |
| 9 |
Etching of high-k dielectric Zr1-xAlxOy films in chlorine-containing plasmas Pelhos K, Donnelly VM, Kornblit A, Green ML, Van Dover RB, Manchanda L, Hu Y, Morris M, Bower E Journal of Vacuum Science & Technology A, 19(4), 1361, 2001 |
| 10 |
Langmuir probe studies of a transformer-coupled plasma, aluminum etcher Malyshev MV, Donnelly VM, Kornblit A, Ciampa NA, Colonell JI, Lee JTC Journal of Vacuum Science & Technology A, 17(2), 480, 1999 |