화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Insights into the high-rate growth of highly crystallized silicon films from inductively coupled plasma of H-2-diluted SiH4
Kosku N, Miyazaki S
Thin Solid Films, 511, 265, 2006
2 Influence of substrate do bias on crystallinity of silicon films grown at a high rate from inductively-coupled plasma CVD
Kosku N, Murakami H, Higashi S, Miyazaki S
Applied Surface Science, 244(1-4), 39, 2005
3 High-rate deposition of highly crystallized silicon films from inductively coupled plasma
Kosku N, Kurisu F, Takegoshi M, Takahashi H, Miyazaki S
Thin Solid Films, 435(1-2), 39, 2003