검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
High precision stress measurement of ion projection lithography mask membranes Torres JL, Wolfe JC, Ruchhoeft P, Kennedy TF, Podolski J, Kragler K, Ehrmann A, Kaesmaier R, Loschner H Journal of Vacuum Science & Technology B, 20(6), 3095, 2002 |
| 2 |
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H Journal of Vacuum Science & Technology B, 17(6), 3127, 1999 |
| 3 |
Low-Voltage Electron-Beam Lithography with Scanning-Tunneling-Microscopy in Air - A New Method for Producing Structures with High Aspect Ratios Kragler K, Gunther E, Leuschner R, Falk G, Vonseggern H, Saemannischenko G Journal of Vacuum Science & Technology B, 14(2), 1327, 1996 |
| 4 |
Patterning of an Electron-Beam Resist with a Scanning Tunneling Microscope Operating in Air Kragler K, Gunther E, Leuschner R, Falk G, Vonseggern H, Saemannischenko G Thin Solid Films, 264(2), 259, 1995 |