| 1 |
Fabrication of block copolymer templates by using dually responsive photoresist bottom layers
Jung K, Bak CH, Ku SJ, Kim JB
Reactive & Functional Polymers, 118, 20, 2017 |
| 2 |
Ultrahigh density sub-10 nm TiO2 nanosheet arrays with high aspect ratios via the spacer-defined double-patterning process
Bak CH, Ku SJ, Jo GC, Jung K, Lee HJ, Kwon SH, Kim JB
Polymer, 60, 267, 2015 |
| 3 |
Fabrication of versatile nanoporous templates with high aspect ratios by incorporation of Si-containing block copolymer into the lithographic bilayer system
Kim SM, Ku SJ, Jo GC, Bak CH, Kim JB
Polymer, 53(11), 2283, 2012 |
| 4 |
SiO2 Nanodot Arrays Using Patterned Functionalization of Self-Assembled Block Copolymer and Selective Adsorption of Amine-Terminated Polydimethylsiloxane
Kim SM, Ku SJ, Kim JB
Macromolecular Research, 19(9), 891, 2011 |
| 5 |
Nanoporous hard etch masks using silicon-containing block copolymer thin films
Ku SJ, Kim SM, Bak CH, Kim JB
Polymer, 52(1), 86, 2011 |
| 6 |
Causal relationship between nuclear energy consumption and economic growth: A multi-country analysis
Yoo SH, Ku SJ
Energy Policy, 37(5), 1905, 2009 |
| 7 |
MOCVD of MgAl2O4 thin films using new single molecular precursors: application of beta-hydrogen elimination to the growth of heterometallic oxide films
Boo JH, Lee SB, Ku SJ, Koh W, Kim C, Yu KS, Kim Y
Applied Surface Science, 169, 581, 2001 |
| 8 |
Chemical-Vapor-Deposition of Al2O3 Films Using Highly Volatile Single Sources
Koh W, Ku SJ, Kim Y
Thin Solid Films, 304(1-2), 222, 1997 |
