화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Behavior of Carbon-Containing Impurities in the Process of Plasma-Chemical Distillation of Sulfur
Mochalov L, Kornev R, Logunov A, Kudryashov M, Mashin A, Vorotyntsev A, Vorotyntsev V
Plasma Chemistry and Plasma Processing, 38(3), 587, 2018
2 Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As-Te Chalcogenide Films
Mochalov L, Nezhdanov A, Kudryashov M, Logunov A, Strikovskiy A, Gushchin M, Chidichimo G, De Filpo G, Mashin A
Plasma Chemistry and Plasma Processing, 37(5), 1417, 2017