검색결과 : 2건
No. | Article |
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1 |
Behavior of Carbon-Containing Impurities in the Process of Plasma-Chemical Distillation of Sulfur Mochalov L, Kornev R, Logunov A, Kudryashov M, Mashin A, Vorotyntsev A, Vorotyntsev V Plasma Chemistry and Plasma Processing, 38(3), 587, 2018 |
2 |
Influence of Plasma-Enhanced Chemical Vapor Deposition Parameters on Characteristics of As-Te Chalcogenide Films Mochalov L, Nezhdanov A, Kudryashov M, Logunov A, Strikovskiy A, Gushchin M, Chidichimo G, De Filpo G, Mashin A Plasma Chemistry and Plasma Processing, 37(5), 1417, 2017 |