검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Study of bilayer silylation process for 193 nm lithography using chemically amplified resist Satou I, Kuhara K, Endo M, Morimoto H Journal of Vacuum Science & Technology B, 17(6), 3326, 1999 |
| 2 |
Reduction of line edge roughness in the top surface imaging process Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3739, 1998 |
| 3 |
Pattern collapse in the top surface imaging process after dry development Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 16(6), 3744, 1998 |
| 4 |
Prospect and Challenges of ArF Excimer-Laser Lithography Processes and Materials Ohfuji T, Ogawa T, Kuhara K, Sasago M Journal of Vacuum Science & Technology B, 14(6), 4203, 1996 |