화학공학소재연구정보센터
검색결과 : 33건
No. Article
1 Synthesis of Silicon Nanoparticles in Nonthermal Capacitively-Coupled Flowing Plasmas: Processes and Transport
Le Picard R, Markosyan AH, Porter DH, Girshick SL, Kushner MJ
Plasma Chemistry and Plasma Processing, 36(4), 941, 2016
2 Plasma atomic layer etching using conventional plasma equipment
Agarwal A, Kushner MJ
Journal of Vacuum Science & Technology A, 27(1), 37, 2009
3 Mechanisms for plasma etching of HfO2 gate stacks with Si selectivity and photoresist trimming
Shoeb J, Kushner MJ
Journal of Vacuum Science & Technology A, 27(6), 1289, 2009
4 Seasoning of plasma etching reactors: Ion energy distributions to walls and real-time and run-to-run control strategies
Agarwal A, Kushner MJ
Journal of Vacuum Science & Technology A, 26(3), 498, 2008
5 Modeling of magnetically enhanced capacitively coupled plasma sources: Two frequency discharges
Yang Y, Kushner MJ
Journal of Vacuum Science & Technology A, 25(5), 1420, 2007
6 Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition
Vyas V, Kushner MJ
Journal of Vacuum Science & Technology A, 24(5), 1955, 2006
7 Effect of nonsinusoidal bias waveforms on ion energy distributions and fluorocarbon plasma etch selectivity
Agarwal A, Kushner MJ
Journal of Vacuum Science & Technology A, 23(5), 1440, 2005
8 Properties of C4F8 inductively coupled plasmas. l. Studies of Ar/c-C4F8 magnetically confined plasmas for etching of SiO2
Li X, Ling L, Hua XF, Oehrlein GS, Wang YC, Vasenkov AV, Kushner MJ
Journal of Vacuum Science & Technology A, 22(3), 500, 2004
9 Properties of c-C4F8 inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C4F8/O-2 discharges
Vasenkov AV, Li X, Oehrlein GS, Kushner MJ
Journal of Vacuum Science & Technology A, 22(3), 511, 2004
10 Extraction of negative ions from pulsed electronegative inductively coupled plasmas having a radio-frequency substrate bias
Subramonium P, Kushner MJ
Journal of Vacuum Science & Technology A, 22(3), 534, 2004