화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Characteristics of Selective Chemical-Vapor-Deposition of Tungsten on Aluminum with a Vapor-Phase Precleaning Technology
Chang KM, Yeh TH, Wang SW, Li CH
Journal of the Electrochemical Society, 144(1), 251, 1997
2 Selective Tungsten CVD on Submicron Contact Hole
Yeh WK, Chen MC, Wang PJ, Liu LM, Lin MS
Thin Solid Films, 270(1-2), 462, 1995
3 Thermal-Stability of Alsicu/W/N(+)P Diodes with and Without Tin Barrier Layer
Yeh WK, Chen MC, Wang PJ, Liu LM, Lin MS
Thin Solid Films, 270(1-2), 526, 1995
4 The Surface-Chemistry and Kinetics of Tungsten Chemical-Vapor-Deposition and Selectivity Loss
Creighton JR
Thin Solid Films, 241(1-2), 310, 1994