화학공학소재연구정보센터
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No. Article
1 Transient stages during the chemical vapour deposition of silicon carbide from CH3SiCl3/H-2: impact on the physicochemical and interfacial properties of the coatings
Chollon G, Langlais F, Placide M, Weisbecker P
Thin Solid Films, 520(19), 6075, 2012
2 Deposition process of Si-B-C ceramics from CH3SiCl3/BCl3/H-2 precursor
Berionneau J, Chollon G, Langlais F
Thin Solid Films, 516(10), 2848, 2008
3 Deposition process of amorphous boron carbide from CH4/BCl3/H-2 precursor
Berjonneau J, Chollon G, Langlais F
Journal of the Electrochemical Society, 153(12), C795, 2006
4 Correlation between homogeneous propane pyrolysis and pyrocarbon deposition
Descamps C, Vignoles GL, Feron O, Langlais F, Lavenac J
Journal of the Electrochemical Society, 148(10), C695, 2001
5 On the CVD of MoSi2: an experimental study from the MoCl4-SiCl4-H-2-Ar precursor with a view to the preparation of C/MoSi2/SiC and SiC/MoSi2/SiC microcomposites
Bobet JL, Vignoles G, Langlais F, Naslain R
Journal of Materials Science, 33(17), 4461, 1998
6 C(B) Materials as Interphases in SiC/SiC Model Microcomposites
Jacques S, Guette A, Langlais F, Naslain R
Journal of Materials Science, 32(4), 983, 1997
7 Characterization of SiC/C (B)/SiC Microcomposites by Transmission Electron-Microscopy
Jacques S, Guette A, Langlais F, Bourrat X
Journal of Materials Science, 32(11), 2969, 1997
8 In-Situ Optical Analysis of the Gas-Phase During the Deposition of Silicon-Carbide from Methyltrichlorosilane
Ganz M, Dorval N, Lefebvre M, Pealat M, Loumagne F, Langlais F
Journal of the Electrochemical Society, 143(5), 1654, 1996
9 Correlations Between Gas-Phase Supersaturation, Nucleation Process and Physicochemical Characteristics of Silicon-Carbide Deposited from Si-C-H-Cl System on Silica Substrates
Lespiaux D, Langlais F, Naslain R, Schamm S, Sevely J
Journal of Materials Science, 30(6), 1500, 1995
10 Physicochemical Properties of SiC-Based Ceramics Deposited by Low-Pressure Chemical-Vapor-Deposition from Ch3Sicl3-H-2
Loumagne F, Langlais F, Naslain R, Schamm S, Dorignac D, Sevely J
Thin Solid Films, 254(1-2), 75, 1995