1 |
Transient stages during the chemical vapour deposition of silicon carbide from CH3SiCl3/H-2: impact on the physicochemical and interfacial properties of the coatings Chollon G, Langlais F, Placide M, Weisbecker P Thin Solid Films, 520(19), 6075, 2012 |
2 |
Deposition process of Si-B-C ceramics from CH3SiCl3/BCl3/H-2 precursor Berionneau J, Chollon G, Langlais F Thin Solid Films, 516(10), 2848, 2008 |
3 |
Deposition process of amorphous boron carbide from CH4/BCl3/H-2 precursor Berjonneau J, Chollon G, Langlais F Journal of the Electrochemical Society, 153(12), C795, 2006 |
4 |
Correlation between homogeneous propane pyrolysis and pyrocarbon deposition Descamps C, Vignoles GL, Feron O, Langlais F, Lavenac J Journal of the Electrochemical Society, 148(10), C695, 2001 |
5 |
On the CVD of MoSi2: an experimental study from the MoCl4-SiCl4-H-2-Ar precursor with a view to the preparation of C/MoSi2/SiC and SiC/MoSi2/SiC microcomposites Bobet JL, Vignoles G, Langlais F, Naslain R Journal of Materials Science, 33(17), 4461, 1998 |
6 |
C(B) Materials as Interphases in SiC/SiC Model Microcomposites Jacques S, Guette A, Langlais F, Naslain R Journal of Materials Science, 32(4), 983, 1997 |
7 |
Characterization of SiC/C (B)/SiC Microcomposites by Transmission Electron-Microscopy Jacques S, Guette A, Langlais F, Bourrat X Journal of Materials Science, 32(11), 2969, 1997 |
8 |
In-Situ Optical Analysis of the Gas-Phase During the Deposition of Silicon-Carbide from Methyltrichlorosilane Ganz M, Dorval N, Lefebvre M, Pealat M, Loumagne F, Langlais F Journal of the Electrochemical Society, 143(5), 1654, 1996 |
9 |
Correlations Between Gas-Phase Supersaturation, Nucleation Process and Physicochemical Characteristics of Silicon-Carbide Deposited from Si-C-H-Cl System on Silica Substrates Lespiaux D, Langlais F, Naslain R, Schamm S, Sevely J Journal of Materials Science, 30(6), 1500, 1995 |
10 |
Physicochemical Properties of SiC-Based Ceramics Deposited by Low-Pressure Chemical-Vapor-Deposition from Ch3Sicl3-H-2 Loumagne F, Langlais F, Naslain R, Schamm S, Dorignac D, Sevely J Thin Solid Films, 254(1-2), 75, 1995 |