검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Spatial Variations of Plasma Parameters in a Hollow Cathode Discharge Andreev SN, Bernatskiy AV, Ochkin VN Plasma Chemistry and Plasma Processing, 41(2), 659, 2021 |
| 2 |
Investigation of Tin and Chromium Metal Plasmas by Langmuir Probe Measurements Burm KTAL Plasma Chemistry and Plasma Processing, 32(2), 393, 2012 |
| 3 |
A Model-Based Analysis of Plasma Parameters and Composition in HBr/X (X=Ar, He, N-2) Inductively Coupled Plasmas Kwon KH, Efremov A, Kim M, Min NK, Jeong J, Kim K Journal of the Electrochemical Society, 157(5), H574, 2010 |
| 4 |
Capability of focused Ar ion beam sputtering for combinatorial synthesis of metal films Nagata T, Haemori M, Chikyow T Journal of Vacuum Science & Technology A, 27(3), 492, 2009 |
| 5 |
Characterization of microwave plasmas for deposition of polyparylene Franz G, Rauter F, Dribinskiy SF Journal of Vacuum Science & Technology A, 27(4), 1035, 2009 |
| 6 |
Effect of gas mixing ratio on etch behavior of ZrO2 thin films in Cl-2-based inductively coupled plasmas Efremov A, Min NK, Jin S, Kwon KH Journal of Vacuum Science & Technology A, 26(6), 1480, 2008 |
| 7 |
Characterization of a capacitively coupled RF plasma for SiO2 deposition: numerical and experimental results Goujon M, Belmonte T, Henrion G Thin Solid Films, 475(1-2), 118, 2005 |