화학공학소재연구정보센터
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No. Article
1 Microstructure Evolution During Spark Plasma Sintering of Metastable (ZrO2-3 mol% Y2O3)-20 wt% Al2O3 Composite Powders
Suffner J, Lattemann M, Hahn H, Giebeler L, Hess C, Cano IG, Dosta S, Guilemany JM, Musa C, Locci AM, Licheri R, Orru R, Cao G
Journal of the American Ceramic Society, 93(9), 2864, 2010
2 Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias
Lattemann M, Helmersson U, Greene JE
Thin Solid Films, 518(21), 5978, 2010
3 Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering
Alami J, Eklund P, Andersson JM, Lattemann M, Wallin E, Bohlmark J, Persson P, Helmersson U
Thin Solid Films, 515(7-8), 3434, 2007
4 Ionized physical vapor deposition (IPVD): A review of technology and applications
Helmersson U, Lattemann M, Bohlmark J, Ehiasarian AP, Gudmundsson JT
Thin Solid Films, 513(1-2), 1, 2006
5 New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition - structural and compositional analysis
Lattemann M, Ulrich S, Ye J
Thin Solid Films, 515(3), 1058, 2006
6 The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
Bohlmark J, Lattemann M, Gudmundsson JT, Ehiasarian AP, Gonzalvo YA, Brenning N, Helmersson U
Thin Solid Films, 515(4), 1522, 2006
7 Guiding the deposition flux in an ionized magnetron discharge
Bohlmark J, Ostbye M, Lattemann M, Ljunguantz H, Rosell T, Helmersson U
Thin Solid Films, 515(4), 1928, 2006