검색결과 : 7건
No. | Article |
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1 |
Microstructure Evolution During Spark Plasma Sintering of Metastable (ZrO2-3 mol% Y2O3)-20 wt% Al2O3 Composite Powders Suffner J, Lattemann M, Hahn H, Giebeler L, Hess C, Cano IG, Dosta S, Guilemany JM, Musa C, Locci AM, Licheri R, Orru R, Cao G Journal of the American Ceramic Society, 93(9), 2864, 2010 |
2 |
Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias Lattemann M, Helmersson U, Greene JE Thin Solid Films, 518(21), 5978, 2010 |
3 |
Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering Alami J, Eklund P, Andersson JM, Lattemann M, Wallin E, Bohlmark J, Persson P, Helmersson U Thin Solid Films, 515(7-8), 3434, 2007 |
4 |
Ionized physical vapor deposition (IPVD): A review of technology and applications Helmersson U, Lattemann M, Bohlmark J, Ehiasarian AP, Gudmundsson JT Thin Solid Films, 513(1-2), 1, 2006 |
5 |
New approach in depositing thick, layered cubic boron nitride coatings by oxygen addition - structural and compositional analysis Lattemann M, Ulrich S, Ye J Thin Solid Films, 515(3), 1058, 2006 |
6 |
The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge Bohlmark J, Lattemann M, Gudmundsson JT, Ehiasarian AP, Gonzalvo YA, Brenning N, Helmersson U Thin Solid Films, 515(4), 1522, 2006 |
7 |
Guiding the deposition flux in an ionized magnetron discharge Bohlmark J, Ostbye M, Lattemann M, Ljunguantz H, Rosell T, Helmersson U Thin Solid Films, 515(4), 1928, 2006 |