검색결과 : 2건
No. | Article |
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1 |
Influence of process parameters on the properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering Banakh O, Heulin T, Schmid PE, Le Dreo H, Tkalcec I, Levy F, Steinmann PA Journal of Vacuum Science & Technology A, 24(2), 328, 2006 |
2 |
Optical, electrical and mechanical properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering Le Dreo H, Banakh O, Keppner H, Steinmann PA, Briand D, de Rooij NF Thin Solid Films, 515(3), 952, 2006 |