화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Influence of process parameters on the properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering
Banakh O, Heulin T, Schmid PE, Le Dreo H, Tkalcec I, Levy F, Steinmann PA
Journal of Vacuum Science & Technology A, 24(2), 328, 2006
2 Optical, electrical and mechanical properties of the tantalum oxynitride thin films deposited by pulsing reactive gas sputtering
Le Dreo H, Banakh O, Keppner H, Steinmann PA, Briand D, de Rooij NF
Thin Solid Films, 515(3), 952, 2006