검색결과 : 23건
| No. | Article |
|---|---|
| 1 |
RETRACTION: Lysyl oxidase is essential for hypoxia-induced metastasis (Retraction of Vol 440, Pg 1222, 2006) Erler JT, Bennewith KL, Nicolau M, Dornhofer N, Kong CT, Le QT, Chi JTA, Jeffrey SS, Giaccia AJ Nature, 579(7799), 456, 2020 |
| 2 |
Wet-chemical etching of metals for advanced semiconductor technology nodes: Ru etching in acidic Ce4+ solutions Philipsen H, Mouwen N, Teck S, Monnens W, Le QT, Holsteyns F, Struyf H Electrochimica Acta, 306, 285, 2019 |
| 3 |
A closed-form solution for laminar film condensation from quiescent pure vapours on curved vertical walls Le QT, Ormiston SJ, Soliman HM International Journal of Heat and Mass Transfer, 73, 834, 2014 |
| 4 |
Effect of UV Irradiation on Modification and Subsequent Wet Removal of Model and Post-Etch Fluorocarbon Residues Le QT, de Marneffe JF, Conard T, Vaesen I, Struyf H, Vereecke G Journal of the Electrochemical Society, 159(3), H208, 2012 |
| 5 |
Towards Fully Aqueous Ozone Wet Strip of 193 nm Photoresist Stack Using UV Pre-Treatments in Low-k Patterning Applications Kesters E, Le QT, Lux M, Pittevils J, Vereecke G, Struyf H, De Gendt S Journal of the Electrochemical Society, 159(5), D287, 2012 |
| 6 |
Characterization of Modification of 193-nm Photoresist by HBr Plasma Vereecke G, Claes M, Le QT, Kesters E, Struyf H, Carleer R, Adriaensens P Electrochemical and Solid State Letters, 14(10), H408, 2011 |
| 7 |
Inhibitory effects of polyphenols isolated from marine alga Ecklonia cava on histamine release Le QT, Li Y, Qian ZJ, Kim MM, Kim SK Process Biochemistry, 44(2), 168, 2009 |
| 8 |
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch Kesters E, Claes M, Le QT, Lux M, Franquet A, Vereecke G, Mertens PW, Frank MM, Carleer R, Adriaensens P, Biebuyk JJ, Bebelman S Thin Solid Films, 516(11), 3454, 2008 |
| 9 |
Effect of surfactant as additive in wet clean solutions on properties of low-k materials Le QT, Jeannot V, Baklanov MR, Vanderheyden R, Boullart W, Vanhaelemeersch S Electrochemical and Solid State Letters, 9(4), F17, 2006 |
| 10 |
Removal of plasma-modified low-k layer using dilute HF: Influence of concentration Le QT, Baklanov MR, Kesters E, Azioune A, Struyf H, Boullart W, Pireaux JJ, Vanhaelemeersch S Electrochemical and Solid State Letters, 8(7), F21, 2005 |