| 1 |
From bulk to nano: A comparative investigation of structural, ferroelectric and magnetic properties of Sm and Ti co-doped BiFeO3 multiferroics
Anwar A, Basith MA, Choudhury S
Materials Research Bulletin, 111, 93, 2019 |
| 2 |
Leakage current and breakdown behavior of bismuth-doped amorphous strontium titanate thin film
Yao MW, Li QX, Li F, Peng Y, Su Z, Yao X
Materials Chemistry and Physics, 206, 48, 2018 |
| 3 |
Electrical evaluation of crack generation in SiNx and SiOxNy thin-film encapsulation layers for OLED displays
Park EK, Kim S, Heo J, Kim HJ
Applied Surface Science, 370, 126, 2016 |
| 4 |
Improved high-k stacks with chemical oxide interfacial layer by DPN/PNA treatment
Li S, Chen YT, Chang SJ
Current Applied Physics, 15(3), 180, 2015 |
| 5 |
Improvement of the electrical properties of TiO2-doped Bi5Nb3O15 thin films by the addition of MnO2
Sun JW, Kweon SH, Seong TG, Kim JS, Jeong BJ, Nahm S
Current Applied Physics, 13(1), 148, 2013 |
| 6 |
Effect of excessive K and Na on the dielectric properties of (K,Na)NbO3 thin films
Li G, Wu XQ, Ren W, Shi P
Thin Solid Films, 548, 556, 2013 |
| 7 |
The electric and dielectric properties of Ag(Ta0.5Nb0.5)O-3 and Ag(Ta0.8Nb0.2)O-3 thick films
Lee KT, Koh JH
Current Applied Physics, 11(3), S56, 2011 |
| 8 |
Ni-Al-O diffusion barrier layer for high-kappa metal-oxide-semiconductor capacitor
Wu DQ, Jia R, Yao JC, Zhao HS, Chang AM
Thin Solid Films, 519(10), 3358, 2011 |
| 9 |
Enhanced leakage current behavior of Sr2Ta2O7-x/SrTiO3 bilayer dielectrics for metal-insulator-metal capacitors
Kaynak CB, Lukosius M, Costina I, Tillack B, Wenger C, Ruhl G, Blomberg T
Thin Solid Films, 519(17), 5734, 2011 |
| 10 |
Basic investigation of HfO2 based metal-insulator-metal diodes
Dudek P, Schmidt R, Lukosius M, Lupina G, Wenger C, Abrutis A, Albert M, Xu K, Devi A
Thin Solid Films, 519(17), 5796, 2011 |
