화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Interface of ultrathin HfO2 films deposited by UV-photo-CVD
Fang Q, Zhang JY, Wang Z, Modreanu M, O'Sullivan BJ, Hurley PK, Leedham TL, Hywel D, Audier MA, Jimenez C, Senateur JP, Boyd IW
Thin Solid Films, 453-54, 203, 2004
2 Interface of tantalum oxide films on silicon by UV annealing at low temperature
Fang Q, Zhang JY, Wang ZM, Wu JX, O'Sullivan BJ, Hurley PK, Leedham TL, Davies H, Audier MA, Jimenez C, Senateur JP, Boyd IW
Thin Solid Films, 428(1-2), 248, 2003
3 Investigation of TiO2-doped HfO2 thin films deposited by photo-CVD
Fang Q, Zhang JY, Wang ZM, Wu JX, O'Sullivan BJ, Hurley PK, Leedham TL, Davies H, Audier MA, Jimenez C, Senateur JP, Boyd IW
Thin Solid Films, 428(1-2), 263, 2003
4 Characterisation of HfO2 deposited by photo-induced chemical vapour deposition
Fang Q, Zhang JY, Wang ZM, Wu JX, O'Sullivan BJ, Hurley RK, Leedham TL, Davies H, Audier MA, Jimenez C, Senateur JP, Boyd IW
Thin Solid Films, 427(1-2), 391, 2003