검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Bis(fluoroalcohol) monomers and polymers: Improved transparency fluoropolymer photoresists for semiconductor photolithography at 1.57 nm Feiring AE, Crawford MK, Farnham WB, French RH, Leffew KW, Petrov VA, Schadt FL, Tran HV, Zumsteg FC Macromolecules, 39(4), 1443, 2006 |
| 2 |
New amorphous fluoropolymers of tetrafluoroethylene with fluorinated and non-fluorinated tricyclononenes. Semiconductor photoresists for imaging at 157 and 193 nm Feiring AE, Crawford MK, Farnham WB, Feldman J, French RH, Junk CP, Leffew KW, Petrov VA, Qiu WM, Schadt FL, Tran HV, Zumsteg FC Macromolecules, 39(9), 3252, 2006 |
| 3 |
6 sigma and solid-state polymerization Leffew KW, Yerrapragada SS, Deshpande PB Chemical Engineering Communications, 188, 109, 2001 |