검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Development and application of a stereoscopic 3-color high-speed ratio-pyrometry Jakob M, Lehnen P, Adomeit P, Pischinger S Combustion and Flame, 161(11), 2825, 2014 |
| 2 |
Transgenic over-expression of interleukin-33 in osteoblasts results in decreased osteoclastogenesis Keller J, Catala-Lehnen P, Wintges K, Schulze J, Bickert T, Ito W, Horst AK, Amling M, Schinke T Biochemical and Biophysical Research Communications, 417(1), 217, 2012 |
| 3 |
Equivalent Oxide Thickness Reduction for High-k Gate Stacks by Optimized Rare-Earth Silicate Reactions Van Elshocht S, Adelmann C, Lehnen P, De Gendt S Electrochemical and Solid State Letters, 12(5), G17, 2009 |
| 4 |
Alternative high-k dielectrics for semiconductor applications Van Elshocht S, Adelmann C, Clima S, Pourtois G, Conard T, Delabie A, Franquet A, Lehnen P, Meersschaut J, Menou N, Popovici M, Richard O, Schram T, Wang XP, Hardy A, Dewulf D, Van Bael MK, Lehnen P, Blomberg T, Pierreux D, Swerts J, Maes JW, Wouters DJ, De Gendt S, Kittl JA Journal of Vacuum Science & Technology B, 27(1), 209, 2009 |
| 5 |
Silicate formation and thermal stability of ternary rare earth oxides as high-k dielectrics Van Elshocht S, Adelmann C, Conard T, Delabie A, Franquet A, Nyns L, Richard O, Lehnen P, Swerts J, De Gendt S Journal of Vacuum Science & Technology A, 26(4), 724, 2008 |
| 6 |
Achieving low-V-T Ni-FUSICMOS via lanthanide incorporation in the gate stack Veloso A, Yu HY, Lauwers A, Chang SZ, Adelmann C, Onsia B, Demand M, Brus S, Vrancken C, Singanamalla R, Lehnen P, Kittl J, Kauerauf T, Vos R, O'Sullivan BJ, Van Elshocht S, Mitsuhashi R, Whittemore G, Yin KM, Niwa M, Hoffmann T, Absil P, Jurczak M, Biesemans S Solid-State Electronics, 52(9), 1303, 2008 |
| 7 |
Metallorganic chemical vapor deposition of dysprosium scandate high-k layers using mmp-type precursors Van Elshocht S, Lehnen P, Seitzinger B, Abrutis A, Adelmann C, Brijs B, Caymax M, Conard T, De Gendt S, Franquet A, Lohe C, Lukosius M, Moussa A, Richard O, Williams P, Witters T, Zimmerman P, Heyns M Journal of the Electrochemical Society, 153(9), F219, 2006 |
| 8 |
Low-temperature growth of polycrystalline ge films on SiO2 substrate by HDPCVD Yang MJ, Shieh J, Hsu SL, Huang IJ, Leu CC, Shen SW, Huang TY, Lehnen P, Chien CH Electrochemical and Solid State Letters, 8(5), C74, 2005 |
| 9 |
Electrical characterization of capacitors with AVD-deposited hafnium silicates as high-k gate dielectric Van Elshocht S, Weber U, Conard T, Kaushik V, Houssa M, Hyun S, Seitzinger B, Lehnen P, Schumacher M, Lindner J, Caymax M, De Gendt S, Heyns M Journal of the Electrochemical Society, 152(11), F185, 2005 |
| 10 |
Effects of low-temperature NH3 treatment on the characteristics of HfO2/SiO2 gate stack Lu WT, Chien CH, Huang IJ, Yang MJ, Lehnen P, Huang TY Journal of the Electrochemical Society, 152(11), G799, 2005 |