화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 Theoretical and experimental study of a thermal damper based on a CNT/PCM composite structure for transient electronic cooling
Kinkelin C, Lips S, Soupremanien U, Remondiere V, Dijon J, Le Poche H, Oilier E, Zegaoui M, Rolland N, Rolland PA, Lhostis S, Descouts B, Kaplan Y, Lefevre F
Energy Conversion and Management, 142, 257, 2017
2 Soft X-ray photoemission study of nitrogen diffusion in TiN/HfO:N gate stacks
Martinez E, Gaumer C, Lhostis S, Licitra C, Silly M, Sirotti F, Renault O
Applied Surface Science, 258(6), 2107, 2012
3 Impact of Oxidation on Ge2Sb2Te5 and GeTe Phase-Change Properties
Gourvest E, Pelissier B, Vallee C, Roule A, Lhostis S, Maitrejean S
Journal of the Electrochemical Society, 159(4), H373, 2012
4 Carbon-doped GeTe: A promising material for Phase-Change Memories
Beneventi GB, Perniola L, Sousa V, Gourvest E, Maitrejean S, Bastien JC, Bastard A, Hyot B, Fargeix A, Jahan C, Nodin JF, Persico A, Fantini A, Blachier D, Toffoli A, Loubriat S, Roule A, Lhostis S, Feldis H, Reimbold G, Billon T, De Salvo B, Larcher L, Pavan P, Bensahel D, Mazoyer P, Annunziata R, Zuliani P, Boulanger F
Solid-State Electronics, 65-66, 197, 2011
5 Chemical and Structural Properties of a TaN/HfO2 Gate Stack Processed Using Atomic Vapor Deposition
Gaumer C, Martinez E, Lhostis S, Wiemer C, Perego M, Loup V, Lafond D, Fabbri JM
Journal of the Electrochemical Society, 156(7), G78, 2009
6 Electrical and Chemical Properties of the HfO2/SiO2/Si Stack: Impact of HfO2 Thickness and Thermal Budget
Martinez E, Leroux C, Benedetto N, Gaumer C, Charbonnier M, Licitra C, Guedj C, Fillot F, Lhostis S
Journal of the Electrochemical Society, 156(8), G120, 2009
7 Addition of yttrium into HfO2 films: Microstructure and electrical properties
Dubourdieu C, Rauwel E, Roussel H, Ducroquet F, Hollander B, Rossell M, Van Tendeloo G, Lhostis S, Rushworth S
Journal of Vacuum Science & Technology A, 27(3), 503, 2009
8 Thin films of the double perovskite Sr2FeMoO6 deposited by pulsed laser deposition
Borges RR, Lhostis S, Bari MA, Versluijs JJ, Lunney JG, Coey JMD, Besse M, Contour JP
Thin Solid Films, 429(1-2), 5, 2003