검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Capacitive discharges driven by combined dc/rf sources Kawamura E, Lieberman MA, Lichtenberg AJ, Hudson EA Journal of Vacuum Science & Technology A, 25(5), 1456, 2007 |
| 2 |
Improved volume-averaged model for steady and pulsed-power electronegative discharges Kim S, Lieberman MA, Lichtenberg AJ, Gudmundsson JT Journal of Vacuum Science & Technology A, 24(6), 2025, 2006 |
| 3 |
Stable and unstable behavior of inductively coupled electronegative discharges Marakhtanov AM, Tuszewski M, Lieberman MA, Chabert P Journal of Vacuum Science & Technology A, 21(6), 1849, 2003 |
| 4 |
Pattern generators and microcolumns far ion beam lithography Scott KL, King TJ, Lieberman MA, Leung KN Journal of Vacuum Science & Technology B, 18(6), 3172, 2000 |
| 5 |
Global-Model for High-Pressure Electronegative Radiofrequency Discharges Lee YT, Lieberman MA, Lichtenberg AJ, Bose F, Baltes H, Patrick R Journal of Vacuum Science & Technology A, 15(1), 113, 1997 |
| 6 |
Measurements of Pulsed-Power Modulated Argon Plasmas in an Inductively-Coupled Plasma Source Ashida S, Shim MR, Lieberman MA Journal of Vacuum Science & Technology A, 14(2), 391, 1996 |
| 7 |
Role of Etch Products in Polysilicon Etching in a High-Density Chlorine Discharge Lee C, Graves DB, Lieberman MA Plasma Chemistry and Plasma Processing, 16(1), 99, 1996 |
| 8 |
Global-Model of Ar, O-2, Cl-2, and Ar/O-2 High-Density Plasma Discharges Lee C, Lieberman MA Journal of Vacuum Science & Technology A, 13(2), 368, 1995 |
| 9 |
Characterization at Different Aspect Ratios (Radius/Length) of a Radio-Frequency Inductively-Coupled Plasma Source Wainman PN, Lieberman MA, Lichtenberg AJ, Stewart RA, Lee C Journal of Vacuum Science & Technology A, 13(5), 2464, 1995 |
| 10 |
Spatially Averaged (Global) Model of Time Modulated High-Density Argon Plasmas Ashida S, Lee C, Lieberman MA Journal of Vacuum Science & Technology A, 13(5), 2498, 1995 |