검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Nickel-aluminum alloy silicides with high aluminum content for contact resistance reduction and integration in n-channel field-effect transistors Koh ATY, Lee RTP, Lim AEJ, Lai DMY, Chi DZ, Hoe KM, Balasubramanian N, Samudra GS, Yeo YC Journal of the Electrochemical Society, 155(3), H151, 2008 |
| 2 |
Metal-gate work function modulation using hafnium alloys obtained by the interdiffusion of thin metallic layers Lim AEJ, Hwang WS, Wang XP, Lai DMY, Samudra GS, Kwong DL, Yeo YC Journal of the Electrochemical Society, 154(4), H309, 2007 |
| 3 |
Full silicidation of silicon gate electrodes using nickel-terbium alloy for MOSFET applications Lim AEJ, Lee RTP, Tung CH, Tripathy S, Kwong DL, Yeo YC Journal of the Electrochemical Society, 153(4), G337, 2006 |