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| No. | Article |
|---|---|
| 1 |
High Selectivity Plasma-Etching of Silicon Dioxide with a Dual-Frequency 27/2 MHz Capacitive Radio-Frequency Discharge Tsai W, Mueller G, Lindquist R, Frazier B, Vahedi V Journal of Vacuum Science & Technology B, 14(5), 3276, 1996 |