검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Damascene Process for Controlled Positioning of Magnetic Colloidal Nanocrystals Chen G, Bodnarchuk MI, Kovalenko MV, Springholz G, Heiss W, Jantsch W, Platzgummer E, Loeschner H, Schotter J Advanced Materials, 22(12), 1364, 2010 |
| 2 |
Argon ion multibeam nanopatterning of Ni-Cu inserts for injection molding Koeck A, Bruck R, Wellenzohn M, Hainberger R, Platzgummer E, Loeschner H, Joechl P, Eder-Kapl S, Ebm C, Czepl P, Kaiblinger K, Pipelka F, Letzkus F, Irmscher M, Heitkamp B Journal of Vacuum Science & Technology B, 28(6), C6B1, 2010 |
| 3 |
Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition Ebm C, Platzgummer E, Loeschner H, Eder-Kapl S, Joechl P, Kuemmel M, Reitinger R, Hobler G, Koeck A, Hainberger R, Wellenzohn M, Letzkus F, Irmscher M Journal of Vacuum Science & Technology B, 27(6), 2668, 2009 |
| 4 |
Charged particle nanopatterning Platzgummer E, Loeschner H Journal of Vacuum Science & Technology B, 27(6), 2707, 2009 |
| 5 |
Projection maskless patterning for nanotechnology applications Platzgummer E, Loeschner H, Gross G Journal of Vacuum Science & Technology B, 26(6), 2059, 2008 |
| 6 |
Nanopatterning of magnetic disks by single-step Ar+ ion projection Dietzel A, Berger R, Loeschner H, Platzgummer E, Stengl G, Bruenger WH, Letzkus F Advanced Materials, 15(14), 1152, 2003 |
| 7 |
Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography Braun D, Gajic R, Kuchar F, Korntner R, Haugeneder E, Loeschner H, Butschke J, Letzkus F, Springer R Journal of Vacuum Science & Technology B, 21(1), 123, 2003 |
| 8 |
Characterization of a process development tool for ion projection lithography Loeschner H, Stengl G, Kaesmaier R, Wolter A Journal of Vacuum Science & Technology B, 19(6), 2520, 2001 |
| 9 |
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Volland B, Shi F, Heerlein H, Rangelow IW, Hudek P, Kostic I, Cekan E, Vonach H, Loeschner H, Horner C, Stengl G, Buschbeck H, Zeininger M, Bleeker A, Benschop J Journal of Vacuum Science & Technology B, 18(6), 3202, 2000 |
| 10 |
Measuring acid generation efficiency in chemically amplified resists with all three beams Szmanda CR, Brainard RL, Mackevich JF, Awaji A, Tanaka T, Yamada Y, Bohland J, Tedesco S, Dal'Zotto B, Bruenger W, Torkler M, Fallmann W, Loeschner H, Kaesmaier R, Nealey PM, Pawloski AR Journal of Vacuum Science & Technology B, 17(6), 3356, 1999 |