검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Thin film atomic layer deposition equipment for semiconductor processing Sneh O, Clark-Phelps RB, Londergan AR, Winkler J, Seidel TE Thin Solid Films, 402(1-2), 248, 2002 |
| 2 |
Interlayer mediated epitaxy of cobalt silicide on silicon (100) from low temperature chemical vapor deposition of cobalt -Formation mechanisms and associated properties Londergan AR, Nuesca G, Goldberg C, Peterson G, Kaloyeros AE, Arkles B, Sullivan JJ Journal of the Electrochemical Society, 148(1), C21, 2001 |