검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Extreme ultraviolet lithography: Status and prospects Benschop J, Banine V, Lok S, Loopstra E Journal of Vacuum Science & Technology B, 26(6), 2204, 2008 |
| 2 |
Reticle's contribution to critical dimension control and overlay in extreme-ultraviolet lithography Meiling H, Benschop JPH, Loopstra E, van der Werf JE, Leenders MHA Journal of Vacuum Science & Technology B, 18(6), 2921, 2000 |