검색결과 : 2건
No. | Article |
---|---|
1 |
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections Myers AM, Lorusso GF, Kim I, Goethals AM, Jonckheere R, Hermans J, Baudemprez B, Ronse K Journal of Vacuum Science & Technology B, 26(6), 2215, 2008 |
2 |
Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy Lorusso GF, Goethals AM, Jonckheere R, Hermans J, Ronse K, Myers AM, Niroomand A, Kim I, Niroomand A, Iwamoto F, Ritter D Journal of Vacuum Science & Technology B, 25(6), 2127, 2007 |