검색결과 : 20건
| No. | Article |
|---|---|
| 1 |
High precision stress measurement of ion projection lithography mask membranes Torres JL, Wolfe JC, Ruchhoeft P, Kennedy TF, Podolski J, Kragler K, Ehrmann A, Kaesmaier R, Loschner H Journal of Vacuum Science & Technology B, 20(6), 3095, 2002 |
| 2 |
Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks Torres JL, Nounu HN, Wasson JR, Wolfe JC, Lutz J, Haugeneder E, Loschner H, Stengl G, Kaesmaier R Journal of Vacuum Science & Technology B, 18(6), 3207, 2000 |
| 3 |
NANOJET: Nanostructuring via a downstream plasmajet Voigt J, Reinker B, Rangelow IW, Mariotto G, Shvets I, Guethner P, Loschner H Journal of Vacuum Science & Technology B, 17(6), 2764, 1999 |
| 4 |
Ion projection lithography: International development program Kaesmaier R, Loschner H, Stengl G, Wolfe JC, Ruchhoeft P Journal of Vacuum Science & Technology B, 17(6), 3091, 1999 |
| 5 |
Experimental results of the stochastic Coulomb interaction in ion projection lithography de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R Journal of Vacuum Science & Technology B, 17(6), 3098, 1999 |
| 6 |
Comparison of silicon stencil mask distortion measurements with finite element analysis Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R Journal of Vacuum Science & Technology B, 17(6), 3107, 1999 |
| 7 |
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices Bruenger WH, Torkler M, Weiss M, Loschner H, Leung K, Lee Y, Hudek P, Rangelow IW, Stangl G, Fallmann W Journal of Vacuum Science & Technology B, 17(6), 3119, 1999 |
| 8 |
Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H Journal of Vacuum Science & Technology B, 17(6), 3127, 1999 |
| 9 |
Ion projection lithography: Status of the MEDEA project and United States European cooperation Gross G, Kaesmaier R, Loschner H, Stengl G Journal of Vacuum Science & Technology B, 16(6), 3150, 1998 |
| 10 |
p-n junction-based wafer flow process for stencil mask fabrication Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R Journal of Vacuum Science & Technology B, 16(6), 3592, 1998 |