검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Chemical and Structural Properties of a TaN/HfO2 Gate Stack Processed Using Atomic Vapor Deposition Gaumer C, Martinez E, Lhostis S, Wiemer C, Perego M, Loup V, Lafond D, Fabbri JM Journal of the Electrochemical Society, 156(7), G78, 2009 |
| 2 |
Interface chemical characterization of novel W/HfO2/GeON/Ge stacks Martinez E, Renault O, Clavelier L, Le Royer C, Hartmann JM, Loup V, Minoret S, Cosnier V, Campidelli Y, Zegenhagen J, Lee TL Journal of Vacuum Science & Technology B, 25(1), 86, 2007 |
| 3 |
Electrical properties Of Si1-yCy/Si/SiO2 interface for sub 50 nm strained-channel nMOSFETs Ducroquet F, Ernst T, Weber O, Hartmann JM, Loup V, Besson P, Brevard L, Di Maria JL, Deleonibus S Applied Surface Science, 224(1-4), 274, 2004 |
| 4 |
Metal-insulator-metal capacitors using Y2O3 dielectric grown by pulsed-injection plasma enhanced metalorganic chemical vapor deposition Durand C, Vallee C, Loup V, Salicio O, Dubourdieu C, Blonkowski S, Bonvalot M, Holliger P, Joubert O Journal of Vacuum Science & Technology A, 22(3), 655, 2004 |
| 5 |
Growth temperature dependence of substitutional carbon incorporation in SiGeC/Si heterostructures Loup V, Hartmann JM, Rolland G, Holliger P, Laugier F, Semeria MN Journal of Vacuum Science & Technology B, 21(1), 246, 2003 |
| 6 |
Effects of temperature and HCl flow on the SiGe growth kinetics in reduced pressure-chemical vapor deposition Hartmann JM, Loup V, Rolland G, Semeria MN Journal of Vacuum Science & Technology B, 21(6), 2524, 2003 |
| 7 |
SiGe growth kinetics and doping in reduced pressure-chemical vapor deposition Hartmann JM, Loup V, Rolland G, Holliger P, Laugier F, Vannuffel C, Semeria MN Journal of Crystal Growth, 236(1-3), 10, 2002 |
| 8 |
Effect of HCl on the SiGe growth kinetics in reduced pressure-chemical vapor deposition Hartmann JM, Champay F, Loup V, Rolland G, Semeria MN Journal of Crystal Growth, 241(1-2), 93, 2002 |
| 9 |
Reduced pressure chemical vapor deposition of Si1-x-yGexCy/Si and S1-yCy/Si heterostructures Loup V, Hartmann JM, Rolland G, Holliger P, Laugier F, Vannuffel C, Semeria MN Journal of Vacuum Science & Technology B, 20(3), 1048, 2002 |