화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Kinetic study of CVD reaction by area-controlled CVD
Mori N, Egashira Y, Ueyama K
Journal of Chemical Engineering of Japan, 33(1), 32, 2000
2 Macro/microcavity method and its application in modeling chemical vapor deposition reaction systems
Hong LS, Shimogaki Y, Komjyama H
Thin Solid Films, 365(2), 176, 2000
3 Chemical reaction engineering in the design of CVD reactors
Komiyama H, Shimogaki Y, Egashira Y
Chemical Engineering Science, 54(13-14), 1941, 1999
4 The role of gas-phase reactions during chemical vapor deposition of copper from (hfac)Cu(tmvs)
Chae YK, Shimogaki Y, Komiyama H
Journal of the Electrochemical Society, 145(12), 4226, 1998
5 Mass-Spectrometric and Kinetic-Study of Low-Pressure Chemical-Vapor-Deposition of Si3N4 Thin-Films from Sih2Cl2 and NH3
Sorita T, Satake T, Adachi H, Ogata T, Kobayashi K
Journal of the Electrochemical Society, 141(12), 3505, 1994