화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Formation of PTFE-like films in CF4 microwave plasmas
Quade A, Polak M, Schroder K, Ohl A, Weltmann KD
Thin Solid Films, 518(17), 4835, 2010
2 Numerical modeling of a He-N-2 capillary surface wave discharge at atmospheric pressure
Petrov GM, Matte JP, Peres I, Margot J, Sadi T, Hubert J, Tran KC, Alves LL, Loureiro J, Ferreira CM, Guerra V, Gousset G
Plasma Chemistry and Plasma Processing, 20(2), 183, 2000
3 Low temperature ZrB2 remote plasma enhanced chemical vapor deposition
Pierson JF, Belmonte T, Czerwiec T, Hertz D, Michel H
Thin Solid Films, 359(1), 68, 2000
4 Dual-Plasma Reactor for Low-Temperature Deposition of Wide Band-Gap Silicon Alloys
Etemadi R, Godet C, Perrin J, Drevillon B, Huc J, Parey JY, Rostaing JC, Coeuret F
Journal of Vacuum Science & Technology A, 15(2), 320, 1997
5 Low-Temperature Chlorine-Based Dry-Etching of III-V Semiconductors
Pearton SJ, Abernathy CR, Kopf RF, Ren F
Journal of the Electrochemical Society, 141(8), 2250, 1994