| 1 |
Effect of N-2/H-2 plasma treatment on the moisture adsorption of MOCVD-TiN films
Huang JK, Huang CL, Chang SC, Cheng YL, Wang YL
Thin Solid Films, 519(15), 4948, 2011 |
| 2 |
Accelerated Superfilling Behavior and Suppressed Agglomeration of CEMOCVD Cu Film Using In Situ Plasma Treatment
Pyo SG, Kim S
Electrochemical and Solid State Letters, 12(1), H14, 2009 |
| 3 |
Surface morphology and light scattering properties of plasma etched ZnO:B films grown by LP-MOCVD for silicon thin film solar cells
Addonizio ML, Antonaia A
Thin Solid Films, 518(4), 1026, 2009 |
| 4 |
Catalytic hydrogenation for improvement of GaAs/Ge solar cell efficiency
Tyagi R, Bal M, Singh M, Mohan S, Haldar T, Naik A, Singh P, Husain M, Agarwal SK
Solar Energy Materials and Solar Cells, 76(3), 257, 2003 |
| 5 |
Growth of InNAs by low-pressure metalorganic chemical vapor deposition employing microwave-cracked nitrogen and in situ generated arsine radicals
Naoi H, Shaw DM, Naoi Y, Collins GJ, Sakai S
Journal of Crystal Growth, 222(3), 511, 2001 |
| 6 |
Heteroepitaxial growth of InAs by low-pressure metalorganic chemical vapor deposition employing in situ generated arsine radicals
Naoi H, Shaw DM, Collins GJ, Sakai S
Journal of Crystal Growth, 219(4), 481, 2000 |
