| 1 |
Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength
Chkhalo NI, Pariev DE, Polkovnikov VN, Salashchenko NN, Shaposhnikov A, Stroulea IL, Svechnikov MV, Vainer YA, Zuev SY
Thin Solid Films, 631, 106, 2017 |
| 2 |
Thermal stability of B-based multilayer mirrors for next generation lithography
Naujok P, Murray K, Yulin S, Patzig C, Kaiser N, Tunnermann A
Thin Solid Films, 642, 252, 2017 |
| 3 |
Interface characterization in B-based multilayer mirrors for next generation lithography
Naujok P, Yulin S, Muller R, Kaiser N, Tunnermann A
Thin Solid Films, 612, 414, 2016 |
| 4 |
Structure, thermal stability and extreme ultraviolet performance of Mo/Y multilayers
Xu DC, Huang QS, Wen MW, Wang ZS
Thin Solid Films, 592, 266, 2015 |
| 5 |
Analytical comparison of parallel beam and Bragg-Brentano diffractometer performances
Verman B, Kim B
Materials Science Forum, 443-4, 167, 2004 |
| 6 |
Structural investigations on ultrathin Mo layers in a-Si : H with emphasis on the island-continuous layer transition
Lohmann M, Klabunde F, Blasing J, Veit P, Drusedau T
Thin Solid Films, 342(1-2), 127, 1999 |
| 7 |
Core-Electron Excitation for Si Photochemical Process Using High-Intensity Monochromatized Synchrotron-Radiation
Iba Y, Sugita Y, Nara Y
Journal of Vacuum Science & Technology A, 15(5), 2561, 1997 |
