검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
SiOF film deposition using FSi(OC2H5)(3) gas in a helicon plasma source Yun SM, Chang HY, Lee KM, Kim DC, Choi CK Journal of the Electrochemical Society, 145(7), 2576, 1998 |
| 2 |
Plasma Fluorination of Polyimide Thin-Films Endo K, Tatsumi T Journal of Vacuum Science & Technology A, 15(6), 3134, 1997 |
| 3 |
Instability of Si-F Bonds in Fluorinated Silicon-Oxide (Siof) Films Formed by Various Techniques Homma T Thin Solid Films, 278(1-2), 28, 1996 |