검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Brillouin scattering studies of polymeric nanostructures Hartschuh R, Ding Y, Roh JH, Kisliuk A, Sokolov AP, Soles CL, Jones RL, Hu TJ, Wu WL, Mahorowala AP Journal of Polymer Science Part B: Polymer Physics, 42(6), 1106, 2004 |
| 2 |
Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes Goldfarb DL, Mahorowala AP, Gallatin GM, Petrillo KE, Temple K, Angelopoulos M, Rasgon S, Sawin HH, Allen SD, Lawson MC, Kwong RW Journal of Vacuum Science & Technology B, 22(2), 647, 2004 |
| 3 |
Etching of polysilicon in inductively coupled Cl-2 and HBr discharges. I. Experimental characterization of polysilicon profiles Mahorowala AP, Sawin HH, Jones R, Labun AH Journal of Vacuum Science & Technology B, 20(3), 1055, 2002 |
| 4 |
Etching of polysilicon in inductively coupled Cl-2 and HBr discharges. II. Simulation of profile evolution using cellular representation of feature composition and Monte Carlo computation of flux and surface kinetics Mahorowala AP, Sawin HH Journal of Vacuum Science & Technology B, 20(3), 1064, 2002 |
| 5 |
Etching of polysilicon in inductively coupled Cl-2 and HBr discharges. III. Photoresist mask faceting, sidewall deposition, and microtrenching Mahorowala AP, Sawin HH Journal of Vacuum Science & Technology B, 20(3), 1077, 2002 |
| 6 |
Etching of polysilicon in inductively coupled Cl-2 and HBr discharges. IV. Calculation of feature charging in profile evolution Mahorowala AP, Sawin HH Journal of Vacuum Science & Technology B, 20(3), 1084, 2002 |
| 7 |
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists Mahorowala AP, Medeiros DR Journal of Vacuum Science & Technology A, 19(4), 1374, 2001 |
| 8 |
Transfer etching of bilayer resists in oxygen-based plasmas Mahorowala AP, Babich K, Lin Q, Medeiros DR, Petrillo K, Simons J, Angelopoulos M, Sooriyakumaran R, Hofer D, Reynolds GW, Taylor JW Journal of Vacuum Science & Technology A, 18(4), 1411, 2000 |
| 9 |
Plasma-surface kinetics and feature profile evolution in chlorine etching of polysilicon Chang JP, Mahorowala AP, Sawin HH Journal of Vacuum Science & Technology A, 16(1), 217, 1998 |