| 1 |
Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering
Malkomes N, Vergohl M, Szyszka B
Journal of Vacuum Science & Technology A, 19(2), 414, 2001 |
| 2 |
Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis
Malkomes N, Szyszka B
Journal of Vacuum Science & Technology A, 19(5), 2368, 2001 |
| 3 |
In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry
Vergohl M, Malkomes N, Matthee T, Brauer G, Richter U, Nickol FW, Bruch J
Thin Solid Films, 392(2), 258, 2001 |
| 4 |
Optimization of the reflectivity of magnetron sputter deposited silver films
Vergohl M, Malkomes N, Szyszka B, Neumann F, Matthee T, Brauer G
Journal of Vacuum Science & Technology A, 18(4), 1632, 2000 |
| 5 |
Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics
Vergohl M, Hunsche B, Malkomes N, Matthee T, Szyszka B
Journal of Vacuum Science & Technology A, 18(4), 1709, 2000 |
| 6 |
Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry
Vergohl M, Malkomes N, Matthee T, Brauer G
Thin Solid Films, 377-378, 43, 2000 |
| 7 |
Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergohl M, Malkomes N, Staedler T, Matthee T, Richter U
Thin Solid Films, 351(1-2), 42, 1999 |
