검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Continuous extraction rate measurements during supercritical CO2 drying of silica alcogel Griffin JS, Mills DH, Cleary M, Nelson R, Manno VP, Hodes M Journal of Supercritical Fluids, 94, 38, 2014 |
| 2 |
Measurement of Microscale Shear Forces during Chemical Mechanical Planarization White RD, Mueller AJ, Shin M, Gauthier D, Manno VP, Rogers CB Journal of the Electrochemical Society, 158(10), H1041, 2011 |
| 3 |
Stick-Slip Transitions in Chemical Mechanical Planarization Vlahakis J, Manno VP, Rogers CB, White R Electrochemical and Solid State Letters, 13(6), II206, 2010 |
| 4 |
Synchronous, In Situ Measurements in Chemical Mechanical Planarization Vlahakis J, Rogers C, Manno VP, White R, Moinpour M, Hooper D, Anjur S Journal of the Electrochemical Society, 156(10), H794, 2009 |
| 5 |
In Situ Investigation of Slurry Flow Fields during CMP Mueller N, Rogers C, Manno VP, White R, Moinpour M Journal of the Electrochemical Society, 156(12), H908, 2009 |
| 6 |
Viewing asperity behavior under the wafer during CMP Gray C, Apone D, Rogers C, Manno VP, Barns C, Moinpour M, Anjur S, Philipossian A Electrochemical and Solid State Letters, 8(5), G109, 2005 |
| 7 |
In situ measurement of pressure and friction during CMP of contoured wafers Scarfo AM, Manno VP, Rogers CB, Anjur SP, Moinpour M Journal of the Electrochemical Society, 152(6), G477, 2005 |
| 8 |
Measurements of slurry film thickness and wafer drag during CMP Lu J, Rogers C, Manno VP, Philipossian A, Anjur S, Moinpourd M Journal of the Electrochemical Society, 151(4), G241, 2004 |