검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Plasma and Processing Effects of Electrode Spacing for Tungsten Etchback Using a Bipolar Electrostatic Wafer Clamp Marx WF, Ra YJ, Yang R, Chen CH Journal of Vacuum Science & Technology A, 12(6), 3087, 1994 |
| No. | Article |
|---|---|
| 1 |
Plasma and Processing Effects of Electrode Spacing for Tungsten Etchback Using a Bipolar Electrostatic Wafer Clamp Marx WF, Ra YJ, Yang R, Chen CH Journal of Vacuum Science & Technology A, 12(6), 3087, 1994 |